This title appears in the Scientific Report :
1999
Fabrication of nanometer Schottky-tunnel MOSFETs by a novel silicide nanopatterning method
Fabrication of nanometer Schottky-tunnel MOSFETs by a novel silicide nanopatterning method
Saved in:
Personal Name(s): | Zhao, Q. T. |
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Kappius, L. / Mesters, S. / Mantl, S. | |
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: |
SPIE-Conference on In-line Methods Monitors for Process and Yield Improvement, which occured at the SPIE Microelectronic MAnufacturing Symposium : Santa Clara, CA, 22.-23.9.1999 / ed.: S. Ajuria ... - Bellingham, Wash., 1999. - (SPIE proceedings series ; 3884). - 0-8194-3481-7 |
Imprint: |
1999
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Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Ionentechnik |
Publikationsportal JuSER |
Description not available. |