This title appears in the Scientific Report :
1999
Nanometer patterning of ultra-thin cobalt disilicide by local application of stress
Nanometer patterning of ultra-thin cobalt disilicide by local application of stress
Saved in:
Personal Name(s): | Zhao, Q. T. |
---|---|
Kluth, P. / Xu, J. / Kappius, L. / Mesters, S. / Mantl, S. | |
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: |
GaN and related alloys - 1999 : symposium at the 1999 MRS Fall Meeting |
Imprint: |
1999
|
Conference: | Boston, Mass. 1999-11-28 00:00:00 |
Document Type: |
Poster |
Research Program: |
Ionentechnik |
Publikationsportal JuSER |
Description not available. |