This title appears in the Scientific Report :
1999
Nanometer Schottky-tunneling MOSFETs fabricated by a novel silicide nanopatterning method
Nanometer Schottky-tunneling MOSFETs fabricated by a novel silicide nanopatterning method
Saved in:
Personal Name(s): | Zhao, Q. T. |
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Kluth, P. / Xu, J. / Kappius, L. / Mesters, S. / Mantl, S. | |
Contributing Institute: |
Institut für Schicht- und Ionentechnik; ISI |
Published in: |
MEL-ARI Projekttreffen |
Imprint: |
1999
|
Conference: | Duisburg 1999-07-07 00:00:00 |
Document Type: |
Talk (non-conference) |
Research Program: |
Ionentechnik |
Publikationsportal JuSER |
Description not available. |