This title appears in the Scientific Report :
2004
High throughput EUV-reflectometer for EUV mask-blanks
High throughput EUV-reflectometer for EUV mask-blanks
Saved in:
Personal Name(s): | Lebert, R. |
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Wies, C. / Juschkin, L. / Jägle, B. / Meisen, M. / Aschke, L. / Sobel, F. / Seitz, H. / Scholze, F. / Ulm, G. / Walter, K. / Neff, W. / Bergmann, K. / Biel, W. | |
Contributing Institute: |
Institut für Plasmaphysik; IPP |
Published in: |
Emerging Lithographic Technologies VIII / ed.: R. S. Mackay. - Bellingham, WA, 2004. - (Proceedings of the SPIE ; 5374). - 0-8194-5287-4. - S. 808 - 817 |
Imprint: |
2004
|
ISBN: |
0-8194-5287-4 |
Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Kernfusion und Plasmaforschung |
Publikationsportal JuSER |
Description not available. |