This title appears in the Scientific Report :
2004
The use of ion implantation and annealing for the fabrication of strained silicon on thin SiGe virtual substrates
The use of ion implantation and annealing for the fabrication of strained silicon on thin SiGe virtual substrates
Saved in:
Personal Name(s): | Mantl, S. |
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Buca, D. M. / Holländer, B. / Mörschbächer, M. / Lenk, S. / Hueging, N. / Luysberg, M. | |
Contributing Institute: |
Institut für Halbleiterschichten und Bauelemente; ISG-1 |
Published in: |
MRS Spring Meeting |
Imprint: |
2004
|
Conference: | San Francisco, CA 2004-04-11 |
Document Type: |
Conference Presentation |
Research Program: |
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |
Publikationsportal JuSER |
Description not available. |