This title appears in the Scientific Report :
2001
Preparation and characterization of ferroelectric thin films prepared by high pressure oxygen sputtering and PLD
Preparation and characterization of ferroelectric thin films prepared by high pressure oxygen sputtering and PLD
Saved in:
Personal Name(s): | Rodriguez Contreras, J. |
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Schubert, J. / Poppe, T. D. / Trithaveesak, O. / Szot, K. / Jia, C. L. / Buchal, C. / Kohlstedt, H. / Waser, R. | |
Contributing Institute: |
Institut für Halbleiterschichten und Bauelemente; ISG-1 Elektrokeramische Materialien; IFF-EKM Mikrostrukturforschung; IFF-IMF Elektrokeramische Materialien; IFF-EKM |
Published in: |
MRS Fall Meeting |
Imprint: |
2001
|
Conference: | Boston, Mass. 2001-11-26 |
Document Type: |
Poster |
Research Program: |
Halbleiterbauelemente und Analytik Ionentechnik |
Publikationsportal JuSER |
Description not available. |