This title appears in the Scientific Report :
2001
The properties of a-Si:H films and devices deposited by hot wire CVD at ultra high deposition rates
The properties of a-Si:H films and devices deposited by hot wire CVD at ultra high deposition rates
Saved in:
Personal Name(s): | Mahan, A. H. |
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Xu, Y. / Perkins, J. D. / Gedvilas, L. M. / Crandall, R. S. / Nelson, B. P. / Williamson, D. L. / Beyer, W. / Cohen, J. D. | |
Contributing Institute: |
Institut für Photovoltaik; IPV |
Published in: |
Amorphous and Heterogeneous Silicon-Based Films / ed.: M. Stutzmann ... - Warrendale, PA, 2001. - (Materials Research Society Symposium Proceedings ; 664). - 1-55899-600-1. - A3.3.1 - 6 |
Imprint: |
2001
|
ISBN: |
1-55899-600-1 |
Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Grundlagen und Technologie von Dünnschichtsolarzellen |
Publikationsportal JuSER |
Description not available. |