This title appears in the Scientific Report :
2004
Improved deposition rate for µc-Si:H at low substrate temperature
Improved deposition rate for µc-Si:H at low substrate temperature
Saved in:
Personal Name(s): | Klein, S. |
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Lossen, J. / Finger, F. / Carius, R. | |
Contributing Institute: |
Institut für Photovoltaik; IPV |
Published in: |
3rd International Conference on HWCVD (Cat-CVD) Process |
Imprint: |
2004
|
Conference: | Utrecht, Niederlande 2004-08-23 |
Document Type: |
Conference Presentation |
Research Program: |
Photovoltaik |
Publikationsportal JuSER |
Description not available. |