This title appears in the Scientific Report :
2004
Diffusion length measurements of microcrystalline silicon thin films prepared by Hot Wire/Catalytic Chemical vapour deposition
Diffusion length measurements of microcrystalline silicon thin films prepared by Hot Wire/Catalytic Chemical vapour deposition
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Personal Name(s): | Okur, S. |
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Günes, M. / Finger, F. / Carius, R. | |
Contributing Institute: |
Institut für Photovoltaik; IPV |
Published in: |
3rd International Conference on HWCVD (Cat-CVD) Process |
Imprint: |
2004
|
Conference: | Utrecht 2004-08-23 |
Document Type: |
Poster |
Research Program: |
Photovoltaik |
Publikationsportal JuSER |
Description not available. |