This title appears in the Scientific Report :
2005
New tailored precursors for the MOCVD of group IVB metal oxides: high-k application
New tailored precursors for the MOCVD of group IVB metal oxides: high-k application
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Personal Name(s): | Thomas, R. |
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Ehrhart, P. / Bhakta, R. / Patil, U. / Devi, A. / Waser, R. | |
Contributing Institute: |
Elektronische Materialien; IFF-IEM Center of Nanoelectronic Systems for Information Technology; CNI |
Published in: |
Materials Research Society Spring Meeting |
Imprint: |
2005
|
Conference: | San Francisco, CA 2005-03-28 |
Document Type: |
Poster |
Research Program: |
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |
Publikationsportal JuSER |
Description not available. |