This title appears in the Scientific Report :
2005
Please use the identifier:
http://hdl.handle.net/2128/2118 in citations.
Please use the identifier: http://dx.doi.org/10.1103/PhysRevB.72.064503 in citations.
Dependence of magnetic penetration depth on the thickness of superconducting Nb thin film
Dependence of magnetic penetration depth on the thickness of superconducting Nb thin film
In this paper we present the results of a systematic study on the magnetic field penetration depth of superconducting niobium thin films. The films of thicknesses ranging from 8 to 300 nm were deposited on a Si substrate by dc magnetron sputtering. The values of the penetration depth lambda(0) were...
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Personal Name(s): | Gubin, A. I. |
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Il'in, K. S. / Vitusevich, S. A. / Siegel, M. / Klein, N. | |
Contributing Institute: |
Institut für Bio- und Chemosensoren; ISG-2 Center of Nanoelectronic Systems for Information Technology; CNI |
Published in: | Physical Review B Physical review / B, 72 72 (2005 2005) 6 6, S. 064503 064503 |
Imprint: |
College Park, Md.
APS
2005
|
Physical Description: |
064503 |
DOI: |
10.1103/PhysRevB.72.064503 |
Document Type: |
Journal Article |
Research Program: |
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |
Series Title: |
Physical Review B
72 |
Subject (ZB): | |
Link: |
Get full text OpenAccess |
Publikationsportal JuSER |
Please use the identifier: http://dx.doi.org/10.1103/PhysRevB.72.064503 in citations.
In this paper we present the results of a systematic study on the magnetic field penetration depth of superconducting niobium thin films. The films of thicknesses ranging from 8 to 300 nm were deposited on a Si substrate by dc magnetron sputtering. The values of the penetration depth lambda(0) were obtained from the measurements of the effective microwave surface impedance by employing a sapphire resonator technique. Additionally, for the films of thickness smaller than 20 nm, the absolute values of lambda(0) were determined by a microwave transmission method. We found that the reduction of the film thickness below 50 nm leads to a significant increase of the magnetic field penetration depth from about 80 nm for 300 nm thick film up to 230 nm for a 8 nm thick film. The dependence of the penetration depth on film thickness is described well by taking into account the experimental dependences of the critical temperature and residual resistivity on the thickness of the niobium films. Structural disordering of the films and suppression of superconductivity due to the proximity effect are considered as mechanisms responsible for the increase of the penetration depth in ultrathin films. |