This title appears in the Scientific Report :
2009
Performance enhancement of uniaxially-tensile strained Si NW-nFETs fabricated by lateral strain relaxation of SSOI
Performance enhancement of uniaxially-tensile strained Si NW-nFETs fabricated by lateral strain relaxation of SSOI
Saved in:
Personal Name(s): | Feste, S. F. |
---|---|
Knoch, J. / Habicht, S. / Buca, D. / Zhao, Q. T. / Mantl, S. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 |
Published in: |
Proceeding of the 10th International Conference on Ultimate Integration of Silicon ULIS, 2009. - S. 109 - 112 |
Imprint: |
2009
|
Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |