This title appears in the Scientific Report :
2005
Influences of Discharge Power and Total Gas Flow Rate in the High Rate Deposition of mµ-Si:H Solar Cells by PECVD
Influences of Discharge Power and Total Gas Flow Rate in the High Rate Deposition of mµ-Si:H Solar Cells by PECVD
Saved in:
Personal Name(s): | Mai, Y. |
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Klein, S. / Carius, R. / Repmann, T. / Geng, X. / Finger, F. | |
Contributing Institute: |
Institut für Photovoltaik; IPV |
Published in: |
Proceedings of the 15th International Photovoltaic Science and Engineering Conference, PVSEC-15, Shanghai, China. - 2005. - S. 941 - 942 |
Imprint: |
2005
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Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Photovoltaik |
Publikationsportal JuSER |
Description not available. |