This title appears in the Scientific Report :
2008
Influence of strain relaxation and atomic interface configuration on the dielectric response of BST thin film capacitors
Influence of strain relaxation and atomic interface configuration on the dielectric response of BST thin film capacitors
Saved in:
Personal Name(s): | Dittmann, R. |
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Plonka, R. / Pertsev, N. / Schützendorf, P. / Jia, C. L. / Mi, S. / Hoffmann-Eifert, S. / Waser, R. | |
Contributing Institute: |
Elektronische Materialien; IFF-6 JARA-FIT; JARA-FIT Mikrostrukturforschung; IFF-8 |
Published in: |
American Physical Society March Meeting 2008 |
Imprint: |
2008
|
Conference: | New Orleans 2008-03-10 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |