This title appears in the Scientific Report :
2006
Ion channeling investigation of patterned Si/SiGe lines with asymmetric biaxial stress
Ion channeling investigation of patterned Si/SiGe lines with asymmetric biaxial stress
Saved in:
Personal Name(s): | Holländer, B. |
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Buca, D. / Feste, S. / Trinkaus, H. / Mantl, S. / Loo, R. / Caymax, M. | |
Contributing Institute: |
Center of Nanoelectronic Systems for Information Technology; CNI Theorie III; IFF-TH-III Institut für Halbleiterschichten und Bauelemente; ISG-1 |
Published in: |
15th International Conference on Ion Beam Modification of Materials |
Imprint: |
2006
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Conference: | Taormina, Italy 2006-09-21 |
Document Type: |
Conference Presentation |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |