This title appears in the Scientific Report :
2007
In-Situ Film Transmittance Using the Plasma as Light Source: A Case Study of Thin Silicon Film Deposition in the Microcrystalline Growth Regime
In-Situ Film Transmittance Using the Plasma as Light Source: A Case Study of Thin Silicon Film Deposition in the Microcrystalline Growth Regime
Saved in:
Personal Name(s): | Dingemans, G. |
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van den Donker, M. N. / Hrunski, D. / Gordijn, A. / Kessels, W. M. M. / van de Sanden, M. C. M. | |
Contributing Institute: |
Photovoltaik; IEF-5 |
Published in: |
Proceedings of the 22nd EUPVSEC (European Photovoltaic Solar Energy Conference), Milan/Italy, 03.09.2007 - 07.09.2007. - S. 1855 - 1858 |
Imprint: |
2007
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Document Type: |
Contribution to a book Contribution to a conference proceedings |
Research Program: |
Erneuerbare Energien |
Publikationsportal JuSER |
Description not available. |