Urban, C., Feste, S. F., Zhao, Q. T., Sandow, C., Müller, M., & Mantl, S. (2008). Schottky barrier height engineering of NiSi/Si contacts by dopant segregation.
Chicago Style CitationUrban, C., S. F. Feste, Q. T. Zhao, C. Sandow, M. Müller, andfavorite S. Mantl. Schottky Barrier Height Engineering of NiSi/Si Contacts By Dopant Segregation. 2008.
MLA CitationUrban, C., et al. Schottky Barrier Height Engineering of NiSi/Si Contacts By Dopant Segregation. 2008.
Warning: These citations may not always be 100% accurate.