Chen, T., Huang, Y., Wang, H., Yang, D., Dasgupta, A., Carius, R., & Finger, F. (2009). Microcrystalline silicon carbide thin films grown by HWCVD at different filament temperatures and their application in n-i-p microcrystalline silicon solar cells. Amsterdam [u.a.]: Elsevier.
Chicago Style CitationChen, T., Y. Huang, H. Wang, D. Yang, A. Dasgupta, R. Carius, andfavorite F. Finger. Microcrystalline Silicon Carbide Thin Films Grown By HWCVD At Different Filament Temperatures and Their Application in N-i-p Microcrystalline Silicon Solar Cells. Amsterdam [u.a.]: Elsevier, 2009.
MLA CitationChen, T., et al. Microcrystalline Silicon Carbide Thin Films Grown By HWCVD At Different Filament Temperatures and Their Application in N-i-p Microcrystalline Silicon Solar Cells. Amsterdam [u.a.]: Elsevier, 2009.