This title appears in the Scientific Report :
2009
Please use the identifier:
http://dx.doi.org/10.1016/j.electacta.2009.03.029 in citations.
Self-aligned nanogaps and nanochannels via conventional photolithography and pattern-size reduction technique
Self-aligned nanogaps and nanochannels via conventional photolithography and pattern-size reduction technique
A simple method for the fabrication of self-aligned nanogaps and fluidic nanochannels by using conventional photolithography combined with patterned-size reduction technique is presented. The method is based on the complete conversion of a photolithographically microstructured metal layer - exhibiti...
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Personal Name(s): | Spelthahn, H. |
---|---|
Poghossian, A. / Schöning, M. J. | |
Contributing Institute: |
Institut für Bio- und Nanosysteme - Bioelektronik; IBN-2 JARA-FIT; JARA-FIT |
Published in: | Electrochimica acta, 54 (2009) S. 6010 - 6014 |
Imprint: |
New York, NY [u.a.]
Elsevier
2009
|
Physical Description: |
6010 - 6014 |
DOI: |
10.1016/j.electacta.2009.03.029 |
Document Type: |
Journal Article |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Series Title: |
Electrochimica Acta
54 |
Subject (ZB): | |
Publikationsportal JuSER |
A simple method for the fabrication of self-aligned nanogaps and fluidic nanochannels by using conventional photolithography combined with patterned-size reduction technique is presented. The method is based on the complete conversion of a photolithographically microstructured metal layer - exhibiting a high expansion coefficient - to a metal oxide with an improved pattern size resolution using thermal oxidation. With this technique, there are no principal limitations to fabricate nanostructures with different layouts down to several nanometer dimensions. In this work, the proposed method is experimentally demonstrated by preparing self-aligned nanogaps and nanochannels on a Si-SiO2 substrate down to 15-20 nm dimensions. (C) 2009 Elsevier Ltd. All rights reserved. |