Untersuchung des Aufbaus von Oxidschichten auf Hochtemperaturlegierungen mit Hilfe der optischen Glimmentladungsspektrometrie
Untersuchung des Aufbaus von Oxidschichten auf Hochtemperaturlegierungen mit Hilfe der optischen Glimmentladungsspektrometrie
The depth profiles of the chemical composition of the oxide scales on the high temperature alloys INCONEL alloy 617, HASTELLOY alloy X and INCOLOY alloy 800H were investigated by means of glow discharge optical spectrometry (GDOS). Due to the bombardment of the sample surface with energetic Ar ions,...
Saved in:
Personal Name(s): | Guntur, D. S. |
---|---|
Fischer, Wolfgang / Mazurkiewicz, M. / Naoumidis, A. / Nickel, Hubertus | |
Contributing Institute: |
Publikationen vor 2000; PRE-2000; Retrocat |
Imprint: |
Jülich
Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag
1992
|
Physical Description: |
III, 133 p. |
Document Type: |
Report Book |
Research Program: |
ohne Topic |
Series Title: |
Berichte des Forschungszentrums Jülich
2592 |
Link: |
OpenAccess |
Publikationsportal JuSER |
The depth profiles of the chemical composition of the oxide scales on the high temperature alloys INCONEL alloy 617, HASTELLOY alloy X and INCOLOY alloy 800H were investigated by means of glow discharge optical spectrometry (GDOS). Due to the bombardment of the sample surface with energetic Ar ions, the scale was removed layer by layer. The sputtered species were excited to optical emission in the discharge plasma. Quantitative intensity-time curves were measured by time resolved registration of the intensity of characteristic emission lines for all elements of interest. The quantification of these curves, i.e. the conversion of the intensity into the elemental concentration and of the time into the depth, was the focus of this work. Mathematical correlations between the intensity of an emission line and the corresponding number of atoms in the plasma and the electrical discharge parameters are discussed in detail. An equation for the conversion of the emission line intensity into the elemental concentration was derived on the base of a reference material of known composition. The calibration of the depth axis was provided by direct measurement of the crater geometry as well as by the determination of the sputtering rate. It is shown that under identical discharge voltage and current the emission yield per atom does not depend on either the matrix from which it is sputtered or the bonding state of the atom. The results of the quantitative GDOS depth analyses were compared with those obtained by means of SIMS, SNMS, EPMA, metallography and x-ray phase analyses. Differences were discussed. |