On the mechanism of sputtering
On the mechanism of sputtering
lt is shown that spot patterns in single crystal sputtering do not necessarily arise as a consequence of focused collision sequences. Spots can be obtained if it is assumed that only the surface of a solid has a regular structure. The spot width is determined by theenergy distribution in the collisi...
Saved in:
Personal Name(s): | Lehmann, C. |
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Sigmund, P. | |
Contributing Institute: |
Publikationen vor 2000; PRE-2000; Retrocat |
Imprint: |
Jülich
Kernforschungsanlage Jülich, Verlag
1966
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Physical Description: |
5 p. |
Document Type: |
Report Book |
Research Program: |
Addenda |
Series Title: |
Berichte der Kernforschungsanlage Jülich
415 |
Link: |
OpenAccess OpenAccess |
Publikationsportal JuSER |
lt is shown that spot patterns in single crystal sputtering do not necessarily arise as a consequence of focused collision sequences. Spots can be obtained if it is assumed that only the surface of a solid has a regular structure. The spot width is determined by theenergy distribution in the collision cascade and the potential barrier at the surface. The contribution of focusons to sputtering is negligible at low bombarding energies because of the small penetration depth of the ions. Recent experimental results indicate that the average pa thlength offocusons contributing to sputtering is extremely small even at high bombarding energies, so that the proposed sputtering mechanism should be dominant over the whole ener'gy range. This result appears to be consistent with collision cascade theory if forward scattering is taken into account. |