This title appears in the Scientific Report :
2018
Please use the identifier:
http://hdl.handle.net/2128/19435 in citations.
Please use the identifier: http://dx.doi.org/10.1063/1.5021393 in citations.
Extreme IR absorption in group IV-SiGeSn core-shell nanowires
Extreme IR absorption in group IV-SiGeSn core-shell nanowires
Sn-containing Si and Ge (Ge1-y-xSixSny) alloys are an emerging family of semiconductors with the potential to impact group IV material-based devices. These semiconductors provide the ability to independently engineer both the lattice parameter and bandgap, which holds the premise to develop enhanced...
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Personal Name(s): | Attiaoui, Anis |
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Wirths, Stephan / Blanchard-Dionne, André-Pierre / Meunier, Michel / Hartmann, J. M. / Buca, Dan / Moutanabbir, Oussama (Corresponding author) | |
Contributing Institute: |
JARA-FIT; JARA-FIT Halbleiter-Nanoelektronik; PGI-9 |
Published in: | Journal of applied physics, 123 (2018) 22, S. 223102 - |
Imprint: |
Melville, NY
American Inst. of Physics
2018
|
DOI: |
10.1063/1.5021393 |
Document Type: |
Journal Article |
Research Program: |
Controlling Electron Charge-Based Phenomena |
Link: |
Published on 2018-06-11. Available in OpenAccess from 2019-06-11. Published on 2018-06-11. Available in OpenAccess from 2019-06-11. |
Publikationsportal JuSER |
Please use the identifier: http://dx.doi.org/10.1063/1.5021393 in citations.
Sn-containing Si and Ge (Ge1-y-xSixSny) alloys are an emerging family of semiconductors with the potential to impact group IV material-based devices. These semiconductors provide the ability to independently engineer both the lattice parameter and bandgap, which holds the premise to develop enhanced or novel photonic and electronic devices. With this perspective, we present detailed investigations of the influence of Ge1-y-xSixSny layers on the optical properties of Si and Ge based heterostructures and nanowires. We found that by adding a thin Ge1-y-xSixSny capping layer on Si or Ge greatly enhances light absorption especially in the near infrared range, leading to an increase in short-circuit current density. For the Ge1-y-xSixSny structure at thicknesses below 30 nm, a 14-fold increase in the short-circuit current is observed with respect to bare Si. This enhancement decreases by reducing the capping layer thickness. Conversely, decreasing the shell thickness was found to improve the short-circuit current in Si/Ge1-y-xSixSny and Ge/Ge1-y-xSixSny core/shell nanowires. The optical absorption becomes very important by increasing the Sn content. Moreover, by exploiting an optical antenna effect, these nanowires show extreme light absorption, reaching an enhancement factor, with respect to Si or Ge nanowires, on the order of 104 in Si/Ge0.84Si0.04Sn0.12 and 12 in Ge/Ge0.84Si0.04Sn0.12. Furthermore, we analyzed the optical response after the addition of a dielectric layer of Si3N4 to the Si/Ge1-y-xSixSny core-shell nanowire and found approximatively a 50% increase in the short-circuit current density for a dielectric layer of thickness equal to 45 nm and both a core radius and a shell thickness greater than 40 nm. The core−shell optical antenna benefits from a multiplication of enhancements contributed by leaky mode resonances in the semiconductor part and antireflection effects in the dielectric part. |