This title appears in the Scientific Report :
2019
Ferroelectricity of doped HfO2 for Negative-Capacitance Transistors
Ferroelectricity of doped HfO2 for Negative-Capacitance Transistors
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Personal Name(s): | Aleksa, Paulus (Corresponding author) |
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Contributing Institute: |
Halbleiter-Nanoelektronik; PGI-9 |
Imprint: |
2018
|
Physical Description: |
54 |
Dissertation Note: |
Masterarbeit, Heinrich-Heine University Düsseldorf, 2018 |
Document Type: |
Master Thesis |
Research Program: |
Controlling Electron Charge-Based Phenomena |
Publikationsportal JuSER |
Description not available. |