Wachstumsuntersuchungen an Bariumtitanat-Dünnschichten, hergestellt mit gepulster Laserdeposition
Wachstumsuntersuchungen an Bariumtitanat-Dünnschichten, hergestellt mit gepulster Laserdeposition
In the process of developing thin film electro-optical waveguides the influence of depositionconditions and of différent substrates on the optical and structural properties ofepitaxial BaTiO$_{3}$ thin films is investigated. These films are grown by pulsed laser deposition(PLD) on MgO(100), MgAl$_{2...
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Personal Name(s): | Siegert, Markus (Corresponding author) |
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Contributing Institute: |
Publikationen vor 2000; PRE-2000; Retrocat |
Imprint: |
Jülich
Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag
2001
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Physical Description: |
V, 102 p. |
Document Type: |
Report Book |
Research Program: |
ohne Topic |
Series Title: |
Berichte des Forschungszentrums Jülich
3898 |
Link: |
OpenAccess OpenAccess |
Publikationsportal JuSER |
In the process of developing thin film electro-optical waveguides the influence of depositionconditions and of différent substrates on the optical and structural properties ofepitaxial BaTiO$_{3}$ thin films is investigated. These films are grown by pulsed laser deposition(PLD) on MgO(100), MgAl$_{2}$O$_{4}$ (100), SrTiO$_{3}$(100) and Al$_{2}$O$_{3}$(1$\overline{1}$02) substrates usingtwo deposition geometries. It was found, that the kinetic energy of the ions in the laserinduced plasma is a critical parameter for the structural properties of the BaTiO$_{3}$ thinfilms. The waveguide losses and the refractive indices were measured with a prism couplingsetup. The optical data are correlated to the results of Rutherford backscatteringspectrometry/ion channeling (RBS/C), X-ray diffraction (XRD), atomic force microscopy(AFM) and transmission electron microscopy (TEM) measurements. Furthermore,the growth of epitaxal layers on Si(100) for waveguides is reviewed. For this purpose, thethickness of the required optical isolation layer is calculated using BPM-simulations andthe results are compared with the technological limits of the attainable film thickness. |