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FGKF - Chemical vapor deposition
IEK-5
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FGKF - Chemical vapor deposition
IEK-5
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Cat-CVD (Hot-Wire CVD) Process : proceedings of the First International Conference on Cat-CVD (Hot-Wire CVD) Process : Kanazawa, Japan, November 14-17, 2000 /
Mahan, A. Harv
2001
Subject (ZB):
“
...thin
film
technology...
”
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2
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Photochemical vapor deposition.
Eden, J. G.
1992
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IEK-5
Name
Eden, J. G.
1
Mahan, A. Harv
1
Subject
chemical vapor deposition
2
thin film technology
1
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FGKF - Chemical vapor deposition
FGK - Thin film technology, epitaxy
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