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FGKF - Chemical vapor deposition
Print Edition
Theses
thin film
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FGKF - Chemical vapor deposition
Print Edition
Theses
thin film
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Metallorganische chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung /
Puchalla, Jochen
2007
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Reaction and transport processes in OMCVD : selective and group III-nitride growth /
Mihopoulos, Theodoros.
1999
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Available as
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2
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Theses
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ZB
2
Name
Mihopoulos, Theodoros.
1
Puchalla, Jochen
1
Subject
chemical vapor deposition
2
thin film
III - V semiconductor
1
modeling
1
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FGKF - Chemical vapor deposition
FJKC - III - V semiconductors
1
Language
German
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