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FGKJ - Plasma processing, etching
Print Edition
chemical vapor deposition
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FGKJ - Plasma processing, etching
Print Edition
chemical vapor deposition
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1
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Principles of plasma discharges and materials processing /
Lichtenberg, Allan J.
2005
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2
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Characterization of plasma enhanced cvd processes: symposium: proceedings : Boston, MA, 27.11.89-28.11.89.
Lucovsky, G.
1990
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3
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Beschichtungen für Hochleistungsbauteile : Symposium : Hagen, 06.11.1986-07.11.1986
1986
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4
Book
Wear and corrosion resistant coatings by CVD and PVD /
Pulker, H. K.
1989
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4
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Conference Publication
2
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ZB
4
IEK-4
1
Name
Bergmann, E.
1
Lichtenberg, Allan J.
1
Lieberman, Michael E.
1
Lucovsky, G.
1
Pulker, H. K.
1
Subject
chemical vapor deposition
coating
1
corrosion resistance
1
discharge
1
evaporation
1
ion implantation
1
more ...
plasma deposition
1
plasma etching
1
plasma physics
1
sputter deposition
1
thin film technology
1
wear resistance
1
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Classification
FGKJ - Plasma processing, etching
FPUG - Special purpose coatings
2
FAF - Materials research - comprehensive works
1
FGKC - Vacuum deposition, MBE
1
FGKF - Chemical vapor deposition
1
FPQ - Surface friction, hardness, wear, lubrication
1
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FPT - Corrosion - specific aspects
1
PGA - Plasma physics
1
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Language
German
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