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FGKJ - Plasma processing, etching
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FGCD - Crystal growth of specific substances
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FGKJ - Plasma processing, etching
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FGCD - Crystal growth of specific substances
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Silicon: chemical etching.
Grabmaier, J.
1982
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Grabmaier, J.
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Heimann, R. B.
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etching
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FGCD - Crystal growth of specific substances
FGKJ - Plasma processing, etching
FJKB - Elemental semiconductors
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