1
Advances in thin film technology : Sputtering and etching : Materials Research Corporation : sputtering schools. 34 and 35 : Roma, Santa-Barbara, CA, 06.84 ; 11.84.
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Weinig, S.
1984
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2
Beschichtungen für Hochleistungsbauteile : Symposium : Hagen, 06.11.1986-07.11.1986
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1986
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3
Bewertung von Plasmareinigungsverfahren als Ergänzung zur Nasschemie : Wuppertal, 18.05.94.
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1994
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4
Characterization of plasma enhanced cvd processes: symposium: proceedings : Boston, MA, 27.11.89-28.11.89.
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5
Colloquium on plasma processing for semiconductors, gas discharge and surface aspects : London, 11.10.1984-11.10.1984.
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1984
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6
Etching for pattern definition: proceedings of the symposium : Electrochemical Society: spring meeting. 1976 : Washington, DC, 02.05.1976-07.05.1976.
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7
La gravure seche et le depot plasma en microelectronique: symposium international. 0003 : Cachan, 26.11.1985-29.11.1985.
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1985
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8
High energy density technologies in materials science. 2 : IGD Scientific Workshop : proceedings : Novara, 03.05.88-04.05.88.
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9
In situ patterning: selective area deposition and etching: symposium : Boston, MA, 29.11.89-01.12.89.
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10
International Conference Ion and Plasma Assisted Techniques. 5 : (IPAT 1985) : München, 13.05.1985-15.05.1985.
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11
International Conference Ion and Plasma Assisted Techniques. 7 : IPAT 1989 : Geneve, 05.89.
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1989
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12
International metal spraying conference 0007 vol 0001: papers : Conference international de metallisation 0007 vol 0001: papers : London, 10.09.73-15.09.73.
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1974
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13
International metal spraying conference 0007 vol 0002: proceedings : Conference internationale de metallisation 0007 vol 0002: proceedings : London, 10.09.73-14.09.73.
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1974
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14
Internationale Tagung Verschleissschutz und Korrosionsschutz durch ionengestuetzte und plasmagestuetzte Vakuumbeschichtungstechnologien (PVD Verfahren) : Darmstadt, 15.03.1983-16.03.1983.
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15
Ion implantation and plasma assisted processes : proceedings of the Conference on Ion Implantation and Plasma Assisted Processes for Industrial Applications, Atlanta, Georgia, 22-25 May 1988 /
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16
Die Ionenätzung als Mittel zur Oberflächenuntersuchung : Schweizerische Gesellschaft für Vakuumphysik und -technik : Vortragstagung. 0003 : Lausanne, 30.05.63-31.05.63.
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17
Ipat 1981 : Ion and plasma assisted techniques: international conference 3 : Amsterdam, 30.06.81-02.07.81.
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1981
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18
Laser assisted deposition, etching, and doping : Los-Angeles, CA, 26.01.1984-27.01.1984 /
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19
Low energy ion beam and plasma modification of materials : Symposium on low energy ion beam and plasma modification of materials : Spring Materials Research Society conference 1991 : Spring MRS conference 1991 : Anaheim, CA, 30.04.91-02.05.91.
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20
Plasma processing and synthesis of materials : Materials Research Society annual meeting. 1983 : Boston, MA, 14.11.1983-17.11.1983.
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