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FFPE - Thin film electronic properties, semiconductor interfaces
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FGKF - Chemical vapor deposition
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FFPE - Thin film electronic properties, semiconductor interfaces
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FGKF - Chemical vapor deposition
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Einfluss von Grenzflächenrauhigkeit, Ordnungseffekten und Dotierungen auf die optischen Eigenschaften von INP- basierten MOCVD- Heterostrukturen.
Oertel, D.
1987
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Selective low pressure chemical vapor deposition of tasi2 on silicon.
Wendling, T. P.
1991
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Oertel, D.
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Wendling, T. P.
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chemical vapor deposition
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interface phenomena
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optical properties
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order parameter
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semiconductor heterostructure
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FFPE - Thin film electronic properties, semiconductor interfaces
FGKF - Chemical vapor deposition
FFME - Surface forces, adhesion, thin film mechanical properties
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