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1

Journal Article

Thin Films of HfO2 for High-k Gate Oxide Applications from Engineered Alkoxide- and Amide-Based MOCVD Precursors

Thomas, R.
2007

Journal of the Electrochemical Society, 154 (2007) S. G77 - G84

“...Thomas, R....”

2

Journal Article

Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2

Milanov, A.
2006

Inorganic chemistry, 45 (2006) S. 11008 - 11018

“...Thomas, R....”

3

Journal Article

Mononuclear precursor for MOCVD of HfO2 thin films

Baunemann, A.
2004

Chemical communications (2004) S. 1610 - 1611

“...Thomas, R....”
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