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Besmehn, A.
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Niinistö, L.
Zentralabteilung für Chemische Analysen; ZCH
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Besmehn, A.
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Niinistö, L.
Zentralabteilung für Chemische Analysen; ZCH
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Journal Article
Characterization of lanthanum lutetium oxide thin films grown by atomic layer deposition as an alternative gate dielectric
Roeckerath, M.
2008
Thin solid films, 517 (2008) S. 201 - 203
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2
Conference Presentation
Amorphous lanthanum lutetium oxide thin films as an alternative high-k material
Lopes, J. M. J.
2007
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Amorphous Lanthanum Lutetium Oxide Thin Films as an Alternative High-k Material : Physics and technology of high-k gate dielectrics 5
Lopes, J. M. J.
2007
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Conference Presentation
1
Contribution to a book
1
Journal Article
1
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Besmehn, A.
Heeg, T.
3
Lopes, J. M. J.
3
Mantl, S.
3
Myllymäki, P.
3
Niinistö, L.
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Roeckerath, M.
3
Schubert, Jürgen
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Adamo, C.
2
Littmark, U.
2
Schlom, D. G.
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Grundlagen für zukünftige Informationstechnologien
3
Contributing Institute
Halbleiter-Nanoelektronik; IBN-1
3
Zentralabteilung für Chemische Analysen; ZCH
Center of Nanoelectronic Systems for Information Technology; CNI
2
JARA-FIT; JARA-FIT
1
Scientific Report
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