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Besmehn, A.
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Rije, E.
Zentralabteilung für Chemische Analysen; ZCH
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Besmehn, A.
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Rije, E.
Zentralabteilung für Chemische Analysen; ZCH
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1
Poster
Characterization of layers and interfaces during the silicide formation of CoSix and NiSiy
Breuer, U.
2005
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2
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Surface characterisation and interface studies of high-k materials by XPS and TOF-SIMS
Besmehn, A.
2005
Applied surface science, 252 (2005) S. 172 - 176
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3
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Characterization of Pt/LaAlO3 Gate Stacks on Si(100)
Rije, E.
2004
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Surface Characterisation and Interface Studies of high-k Materials with XPS and TOF-SIMS
Besmehn, A.
2004
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Besmehn, A.
Breuer, U.
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Scholl, A.
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Lenk, Steffi
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Luysberg, Martina
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Research Program
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
4
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Institut für Halbleiterschichten und Bauelemente; ISG-1
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Zentralabteilung für Chemische Analysen; ZCH
Elektronische Eigenschaften; IFF-IEE
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