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Besmehn, A.
Zentralabteilung für Chemische Analysen; ZCH
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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Besmehn, A.
Zentralabteilung für Chemische Analysen; ZCH
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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1
Poster
TOF-SIMS studies on Rose Bengal devices: Search for the mechanism responsible for resistive switching
Besmehn, A.
2005
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2
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Characterization of layers and interfaces during the silicide formation of CoSix and NiSiy
Breuer, U.
2005
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3
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Surface characterisation and interface studies of high-k materials by XPS and TOF-SIMS
Besmehn, A.
2005
Applied surface science, 252 (2005) S. 172 - 176
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4
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Characterization of Pt/LaAlO3 Gate Stacks on Si(100)
Rije, E.
2004
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5
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Surface Characterisation and Interface Studies of high-k Materials with XPS and TOF-SIMS
Besmehn, A.
2004
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6
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Oberflächenanalytik in der Forschung - Applikationen und künftige Herausforderungen
Scholl, A.
2003
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Besmehn, A.
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Research Program
Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
Contributing Institute
Zentralabteilung für Chemische Analysen; ZCH
Institut für Halbleiterschichten und Bauelemente; ISG-1
4
Elektronische Eigenschaften; IFF-IEE
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Elektronische Materialien; IFF-IEM
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