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Ehrhart, P.
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Fitsilis, F.
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Schumacher, M.
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Waser, R.
Elektrokeramische Materialien; IFF-EKM
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Ehrhart, P.
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Fitsilis, F.
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Schumacher, M.
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Waser, R.
Elektrokeramische Materialien; IFF-EKM
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1
Poster
Growth of (Ba,Sr)TiO3 thin films by MOCVD: stoichiometry effects
Ehrhart, P.
2003
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Nucleation and growth of thin (Ba,Sr)TiO3 films in a MOCVD reactor
Regnery, S.
2003
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Conference Presentation
Nucleation and growth of thin (Ba,Sr)TiO3 films in a MOCVD reactor
Regnery, S.
2002
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Growth of (Ba,Sr)TiO3 thin films by MOCVD : stoichiometry effects
Ehrhart, P.
2002
Integrated ferroelectrics, 45 (2002) S. 59 - 68
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BST thin films grown in a multi-wafer MOCVD reactor
Fitsilis, F.
2001
Journal of the European Ceramic Society, 21 (2001) S. 1547 - 1551
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Growth of (Ba,Sr)TiO3 thin films in a multi-wafer MOCVD reactor
Ehrhart, P.
2001
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Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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