JuLib | Articles & more - {"JARA-FIT; JARA-FIT"}

1

Contribution to a book
Contribution to a conference proceedings

Planar and Nanowire Schottky Barrier MOSFETs on SOI with NiSi and Epitaxial NiSi2 Contacts

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

2

Electrical characterization of O-gated uniaxial tensile strained Si nanowire-array metal-oxide-semiconductor field effect transistors with <100> and <110> channel orientations

Habicht, S.
2012

Thin solid films, 520 (2012) S. 3332 - 3336

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

3

Conference Presentation

High Mobility Materials and Structures for Low Power Device Application

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

4

Talk (non-conference)

Hole mobility enhancement of quantum-well p-MOSFETs on sSi/sSi0.5Ge0.5/sSOI heterostructure

Yu, W.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

5

Talk (non-conference)

Planar and Nanowire Schottky Barrier MOSFETs on SOI with NiSi and Epitaxial NiSi2 Contacts

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

6

Conference Presentation

Ultrathin epitaxial Ni-silicide contacs on Si and SiGe: Structural and electrical investigation

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

7

Contribution to a book
Contribution to a conference proceedings

Si/SiGe Hetero-Structure Tunneling Field Effect Transistors with In-Situ Doped SiGe Source

Schmidt, M.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

8

Contribution to a book
Contribution to a conference proceedings

Strained Silicon Nanowire Array MOSFETs with High-k/Metal Gate Stack

Richter, S.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

9

Contribution to a book
Contribution to a conference proceedings

Nanowire and Planar UTB SOI Schottky Barrier MOSFETs with Dopant Segregation

Knoll, L.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

10

Contribution to a book
Contribution to a conference proceedings

Ultrathin epitaxial Ni-silicide contacts on Si and SiGe: Structural and electrical investigation

Zhao, Q.T.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

11

Contribution to a book
Contribution to a conference proceedings

Epitaxial growth and properties of NiSiGe

Zhang, B.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

12

Contribution to a book
Contribution to a conference proceedings

Hole mobility enhancement of quantum-well p-MOSFETs on sSi/sSi0.5 Ge0.5/sSOI heterostructure

Yu, W.
2012

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

13

Journal Article

LaLuO3 higher-k dielectric integration in SOI MOSFETs with a gate-first process

Nichau, A.
2012

Solid state electronics, 71 (2012) S. 19 - 24

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

14

Journal Article

Impact of strain and Ge concentration on the performance pf planar SiGe band-to-band-tunneling transistors

Schmidt, M.
2012

Solid state electronics, 71 (2012) S. 42 - 47

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

15

Journal Article

20 nm Gate length Schottky MOSFETs with ultra-thin NiSi/epitaxial NiSi2 source/drain

Knoll, L.
2012

Solid state electronics, 71 (2012) S. 88 - 92

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

16

Journal Article

Tunneling field-effect transistor with a strained Si channel and a Si0.5Ge0.5 source

Zhao, Q.T.
2012

Solid state electronics, 74 (2012) S. 97-101

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

17

Journal Article

Simulation of Fabricated 20-nm Schottky Barrier MOSFETs on SOI:Impact of barrier Lowering

Padilla, J.L.
2012

IEEE Transactions on Electron Devices, 59 (2012) S. 1320 - 1327

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

18

Journal Article

Hole Transport in Strained Si0.5Ge0.5 QW-MOSFETs with <110> and <100> Channel Orientations

Minamisawa, R.A.
2012

IEEE electron device letters, 33 (2012) S. 1105 - 1107

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

19

Journal Article

Hole Mobilities of Si/Si0.5Ge0.5 Quantum-Well Transistor on SOI and Strained SOI

Yu, W.
2012

IEEE electron device letters, 33 (2012) S. 758 - 760

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

20

Journal Article

Rare-earth oxide/TiN gate stacks on high mobility strained silicon on insulator for fully depleted metal-oxide-semiconductor field-effect transistors

Durgun Özben, E.
2011

Journal of vacuum science & technology / B, 29 (2011) S. 01A903

“...JARA-FIT; JARA-FIT Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology...”

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