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1

Journal Article

Synthesis and characterisation of zirconium–amido guanidinato complex: a potential precursor for ZrO2 thin films

Devi, A.
2007

Dalton transactions (2007) S. 1671 - 1676

“...Thomas, R....”

2

Journal Article

Thin Films of HfO2 for High-k Gate Oxide Applications from Engineered Alkoxide- and Amide-Based MOCVD Precursors

Thomas, R.
2007

Journal of the Electrochemical Society, 154 (2007) S. G77 - G84

“...Thomas, R....”

3

Journal Article

Thin Films of ZrO2 for High-k Applications Employing Engineered Alkoxide- and Amide-Based MOCVD Precursors

Thomas, R.
2007

Chemical vapor deposition, 13 (2007)

“...Thomas, R....”

4

Journal Article

Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2

Milanov, A.
2006

Inorganic chemistry, 45 (2006) S. 11008 - 11018

“...Thomas, R....”

5

Journal Article

Liquid injection MOCVD of ZrO2 thin films using a novel zirconium Bis(diethylamido)-bis(di-tert-butylmalonato) as a novel precursor

Thomas, R.
2006

Chemical vapor deposition, 12 (2006) S. 295 - 300

“...Thomas, R....”

6

Journal Article

Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

Milanov, A.
2006

Journal of materials chemistry, 16 (2006) S. 437

“...Thomas, R....”

7

Journal Article

MOCVD of ZrO2 and HfO2 Thin Films from Modified Monomeric Precursors

Patil, U.
2006

Chemical vapor deposition, 12 (2006) S. 172

“...Thomas, R....”

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