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Waser, R.
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Schroeder, H.
Institut für Festkörperforschung; IFF
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Waser, R.
AND
Schroeder, H.
Institut für Festkörperforschung; IFF
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1
Poster
Degradation mechanisms of SrBi2Ta2O9 ferroelectric thin film capacitors during forming gas annealing
Hartner, W.
2000
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2
Lecture
Vertiefungsfach II
Waser, R.
2000
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3
Lecture
Neue Materialien und Bauelemente für die Informationstechnik I
Waser, R.
2000
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4
Journal Article
Influence of dry etching using argon on structural and electrical properties of crystalline and non-crystalline SrBi2Ta2O9
Hartner, W.
1999
Integrated ferroelectrics, 27 (1999)
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Charge transport dc field effects, and long-term reliability of electroceramic thin films
Hoffmann, S.
1999
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Talk (non-conference)
Influence of dry etching using argon on structural and electrical properties of crystalline and non-crystalline SrBi2Ta2O9
Hartner, W.
1999
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Name
Schroeder, H.
Waser, R.
Dehm, C.
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Hartner, W.
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Research Program
Festkörperforschung für die Informationstechnik
6
Contributing Institute
Institut für Festkörperforschung; IFF
Scientific Report
1999
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