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Institut für Photovoltaik; IPV
Roschek, T.
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Institut für Photovoltaik; IPV
Roschek, T.
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1
Poster
Structure of microcrystalline PECVD silicon films for solar cells
Edelman, F.
2000
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Structure of Si:H films fabricated by plasma-enhanced CVD using hydrogen diluted plasma
Edelman, F.
2000
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3
Poster
Structure of Si:H films fabricated by plasma-enhanced CVD using hydrogen-diluted plasma
Edelman, F.
2000
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4
Poster
Microcrystalline p-layers prepared by RF-PECVD for silicon thin film solar cells with zinc oxide front contact
Roschek, T.
2000
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5
Talk (non-conference)
Effiziente a-Si:H/muc-Si:H-Tandemsolarzellen hergestellt mit PECVD bei 13.56 MHz Anregungsfrequenz
Roschek, T.
2000
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6
Talk (non-conference)
High rate deposition of microcrystalline silicon solar cells using 13.56 MHz
Roschek, T.
2000
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7
Talk (non-conference)
High rate deposition of microcrystalline silicon solar cells using 13.56 MHz
Roschek, T.
2000
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8
Poster
Large area deposition of intrinsic microcrystalline silicon for thin film solar cells
Repmann, T.
2000
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Name
Rech, B.
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Roschek, T.
Wagner, H.
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Müller, J.
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Chack, A.
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Research Program
Grundlagen und Technologie von Dünnschichtsolarzellen
8
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Institut für Photovoltaik; IPV
Scientific Report
2000
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