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Contribution to a book
Electrical and structural properties of ternary rare-earth oxides on Si and higher mobility substrates and their integration as high-k gate dielectrics in MOSFET devices
Lopes, J.M.J.
2011
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Tiedemann
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Impact of strain and Ge concentration on the performance of planar SiGe band-to-band-tunneling transistors
Schmidt, M.
2011
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Tiedemann
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Luptak, R.
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Mantl, S.
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Tiedemann, Andreas
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Zhao, Q.T.
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Buca, Dan Mihai
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Durgun Özben, E.
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Hartmann, J.-M.
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Lenk, Steffi
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Lopes, J.M.J.
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Luysberg, Martina
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Minamisawa, R.A.
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Grundlagen für zukünftige Informationstechnologien
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Halbleiter-Nanoelektronik; PGI-9
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JARA-FIT; JARA-FIT
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Mikrostrukturforschung; PGI-5
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Zentralabteilung für Chemische Analysen; ZCH
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