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Poster
Grundlagen und Technologie von Dünnschichtsolarzellen
Beyer, W.
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Poster
Grundlagen und Technologie von Dünnschichtsolarzellen
Beyer, W.
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1
Poster
Microcrystalline silicon solar cells prepared by 13.56 Mhz PECVD at high growth rates : solar cell and material properties
Roschek, T.
2001
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2001
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2
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Comparison between the crystallization process of pure and doped a-Si by laser and furnace annealing
Chack, A.
2001
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2001
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3
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Microstructural characterization of hard hydrogenated amorphous silicon-carbon alloys
Camargo, Jr. S. S.
2001
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4
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Inert gas diffusion in DLC-Si films
Camargo, Jr. S. S.
2001
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5
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Microstructure characterization of hydrogenated amorphous silicon films by rare gas effusion studies
Beyer, W.
2001
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6
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Cross-section of a-Si:H solar cell prepared by PECVD at the edge of crystallization
Edelman, F.
2001
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7
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Structural characterization of a-Si:H alloys prepared by dc sputtering
Saleh, R.
2001
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7
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Poster
Name
Beyer, W.
Beserman, R.
3
Chack, A.
3
Weil, R.
3
Camargo, Jr. S. S.
2
Edelman, F.
2
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Rech, B.
2
Roschek, T.
2
Werner, P.
2
Khait, Y. L.
1
Munisa, L.
1
Saleh, R.
1
Scholz, R.
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Research Program
Grundlagen und Technologie von Dünnschichtsolarzellen
Contributing Institute
Institut für Photovoltaik; IPV
7
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2001
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