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1

Journal Article

Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

Milanov, A.
2006

Journal of materials chemistry, 16 (2006) S. 437

“...Thomas, R....”

2

Journal Article

Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2

Milanov, A.
2006

Inorganic chemistry, 45 (2006) S. 11008 - 11018

“...Thomas, R....”

3

Journal Article

Liquid injection MOCVD of ZrO2 thin films using a novel zirconium Bis(diethylamido)-bis(di-tert-butylmalonato) as a novel precursor

Thomas, R.
2006

Chemical vapor deposition, 12 (2006) S. 295 - 300

“...Thomas, R....”

4

Journal Article

MOCVD of ZrO2 and HfO2 Thin Films from Modified Monomeric Precursors

Patil, U.
2006

Chemical vapor deposition, 12 (2006) S. 172

“...Thomas, R....”

5

Journal Article

Dysprosium scandate thin films as an alternate amorphous gate oxide prepared by metal-organic chemical vapor deposition

Thomas, R.
2006

Applied physics letters, 89 (2006) S. 232902

“...Thomas, R....”
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6

Journal Article

Electrical properties of (Ba, Sr) TiO3 thin films revisited: the case of chemical vapor deposited films on Pt electrodes

Ehrhart, P.
2006

Journal of applied physics, 99 (2006) S. 114108

“...Thomas, R....”
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