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Zentralabteilung für Chemische Analysen; ZCH
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Zentralabteilung für Chemische Analysen; ZCH
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1
Journal Article
LaLuO3 higher-k dielectric integration in SOI MOSFETs with a gate-first process
Nichau, A.
2012
Solid state electronics, 71 (2012) S. 19 - 24
“
...
Schubert
, Jürgen...
”
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2
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Lanthanum Lutetium oxide integration in a gate-first process on SOI MOSFETs
Nichau, A.
2011
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Schubert
, Jürgen...
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3
Contribution to a book
Amorphous Lanthanum Lutetium Oxide Thin Films as an Alternative High-k Material : Physics and technology of high-k gate dielectrics 5
Lopes,
J
. M.
J
.
2007
“
...Lopes,
J
. M.
J
....
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4
Conference Presentation
Amorphous lanthanum lutetium oxide thin films as an alternative high-k material
Lopes,
J
. M.
J
.
2007
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...Lopes,
J
. M.
J
....
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4
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Contribution to a book
2
Conference Presentation
1
Contribution to a conference proceedings
1
Journal Article
1
Name
Besmehn, A.
4
Mantl, S.
4
Schubert, Jürgen
4
Adamo, C.
2
Buca, Dan Mihai
2
Castro, G.R.
2
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Dürgün-Özben, Eylem
2
Habicht, S.
2
Heeg, T.
2
Knoll, L.
2
Lenk, Steffi
2
Littmark, U.
2
Lopes, J. M. J.
2
Lopes, J.M.J.
2
Luptak, R.
2
Luysberg, Martina
2
Mussmann, V.
2
Myllymäki, P.
2
Nichau, A.
2
Niinistö, L.
2
Roeckerath, M.
2
Rubio-Zuazo, J.
2
Schlom, D. G.
2
Schnee, M.
2
Zhao, Q.T.
2
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Research Program
Grundlagen für zukünftige Informationstechnologien
4
Contributing Institute
Zentralabteilung für Chemische Analysen; ZCH
Center of Nanoelectronic Systems for Information Technology; CNI
2
Halbleiter-Nanoelektronik; IBN-1
2
Halbleiter-Nanoelektronik; PGI-9
2
JARA-FIT; JARA-FIT
2
Mikrostrukturforschung; PGI-5
2
Scientific Report
2007
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2011
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2012
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