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Contemporary preparative techniques.

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Personal Name(s): Francombe, M. H., editor
Imprint: Boston, MA : Academic Pr., 1989.
Physical Description: X, 259 S.
Note: englisch
ISBN: 0125330146
9780125330145
Series Title: Physics of thin films ; 14.
Keywords: reactive sputtering
plasma oxidation
cathodic arc plasma deposition of thin films
preparation of substrates for film deposition using glow discharge techniques
Subject (ZB):
thin film physics
Classification:
FFP - Physics of thin films
FGK - Thin film technology, epitaxy
Shelf Classification:
FFP - Physik dünner Filme
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Reading Room Call Number: FFP 001-14 Barcode: 1089103791 Available   
Open Stacks Call Number: S 000482-0014'01' Barcode: 1089104389 Available   

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