Modeling of film deposition for microelectronic applications.
Saved in:
Personal Name(s): | Rossnagel, S., editor |
---|---|
Imprint: |
San-Diego, CA :
Academic Pr.,
1996.
|
Physical Description: |
XIV, 290 S. |
Note: |
englisch |
ISBN: |
9780125330220 0125330227 |
Series Title: |
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"name" and "number" keys or a flat string containing only the series
name. We should account for both cases to maximize compatibility. */?>
Thin films ;
22. |
Keywords: |
computer modeling |
Subject (ZB): | |
Classification: | |
Shelf Classification: |
LEADER | 01110cam a2200337 n 4500 | ||
---|---|---|---|
001 | 146550 | ||
005 | 19971208000000.0 | ||
008 | r1996 | ||
020 | |a 0125330227 | ||
035 | |a (Sirsi) a130265 | ||
084 | 0 | |a FANE - Computational solid state physics |2 ZB | |
084 | 0 | |a FGK - Thin film technology, epitaxy |2 ZB | |
084 | 0 | |a FGM - Microelectronic technology |2 ZB | |
084 | 1 | |a FFP - Physik dünner Filme |2 LS | |
245 | 0 | 0 | |a Modeling of film deposition for microelectronic applications. |
260 | |a San-Diego, CA : |b Academic Pr., |c 1996. | ||
300 | |a XIV, 290 S. | ||
490 | 0 | |a Thin films ; |v 22. | |
500 | |a englisch | ||
596 | |a 1 | ||
650 | 4 | |a thin film physics | |
650 | 4 | |a mathematical method | |
650 | 4 | |a simulation | |
650 | 4 | |a sputter deposition | |
650 | 4 | |a chemical vapor deposition | |
653 | |a computer modeling | ||
700 | 1 | |a Rossnagel, S., |e Hrsg. | |
900 | |a S 000482-0022'01' | ||
900 | |a FFP 001-22 | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a FFP 001-22 |w LC |c 1 |i 1097100599 |d 13/1/2016 |e 21/12/2015 |l STACKS |m ZB |n 5 |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT |