Rapid thermal and integrated processing 0002 : Rapid thermal and integrated processing: symposium: papers : MRS spring meeting 1993: symposium G: papers : San-Francisco, CA, 12.04.93-15.04.93.
rapid thermal and integrated processing :
Saved in:
Personal Name(s): | Gelpey, J. C., editor |
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Imprint: |
Pittsburgh, PA :
Materials Research Society,
1993.
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Physical Description: |
XII, 424 S. |
Note: |
englisch |
ISBN: |
9781558991996 1558991999 |
Series Title: |
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Materials Research Society symposium proceedings ;
303. |
Subject (ZB): | |
Classification: | |
Shelf Classification: |
LEADER | 01596cam a2200385 n 4500 | ||
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001 | 50901 | ||
005 | 20041021111200.0 | ||
008 | r1993 | ||
020 | |a 1558991999 | ||
035 | |a (Sirsi) a49299 | ||
084 | 0 | |a FAF - Materials research - comprehensive works |2 ZB | |
084 | 0 | |a FGJ - Laser and electron beam processing |2 ZB | |
084 | 1 | |a FAF - Materialforschung - allgemeine Serien |2 LS | |
245 | 0 | 0 | |a Rapid thermal and integrated processing 0002 : |b Rapid thermal and integrated processing: symposium: papers : MRS spring meeting 1993: symposium G: papers : San-Francisco, CA, 12.04.93-15.04.93. |
260 | |a Pittsburgh, PA : |b Materials Research Society, |c 1993. | ||
300 | |a XII, 424 S. | ||
490 | 0 | |a Materials Research Society symposium proceedings ; |v 303. | |
500 | |a englisch | ||
520 | |a rapid thermal and integrated processing : | ||
520 | |a rapid thermal cvd of semiconductors and dielectrics | ||
520 | |a silicides and barriers | ||
520 | |a temperature measurement for rtp | ||
520 | |a Rtp equipment issues and modeling | ||
520 | |a rapid thermal annealing (rta) | ||
520 | |a rapid thermal oxidation and nitridation | ||
520 | |a Rta/rtp and integrated processing | ||
520 | |a novel processes and applications | ||
596 | |a 1 | ||
650 | 4 | |a rapid thermal processing | |
700 | 1 | |a Gelpey, J. C., |e Hrsg. | |
710 | 2 | |a Materials Research Society. | |
900 | |a FAF 007-303 | ||
900 | |a S 004937-0303'01' | ||
908 | |a Konferenz | ||
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