Applied atomic collision physics. 4. Condensed matter.
Saved in:
Personal Name(s): | Datz, S., editor |
---|---|
Imprint: |
Orlando, FL :
Academic Pr.,
1983.
|
Physical Description: |
XIV, 630 S. |
Note: |
englisch |
ISBN: |
9780124788046 0124788041 |
Series Title: |
/* Depending on the record driver, $field may either be an array with
"name" and "number" keys or a flat string containing only the series
name. We should account for both cases to maximize compatibility. */?>
Pure and applied physics ;
43,4. |
Keywords: |
ion implantation : semiconductor preparation |
Subject (ZB): | |
Classification: |
LEADER | 01212cam a2200361 n 4500 | ||
---|---|---|---|
001 | 108252 | ||
005 | 19980812000000.0 | ||
008 | r1983 | ||
020 | |a 0124788041 | ||
035 | |a (Sirsi) a97460 | ||
084 | 0 | |a FGGJ - Ion beam analysis, ion beam solid interaction |2 ZB | |
245 | 0 | 0 | |a Applied atomic collision physics. |n 4. |p Condensed matter. |
260 | |a Orlando, FL : |b Academic Pr., |c 1983. | ||
300 | |a XIV, 630 S. | ||
490 | 0 | |a Pure and applied physics ; |v 43,4. | |
500 | |a englisch | ||
596 | |a 1 | ||
650 | 4 | |a ion beam solid interaction | |
650 | 4 | |a ion scattering | |
650 | 4 | |a ion surface collision | |
650 | 4 | |a SIMS (secondary ion mass spectroscopy) | |
650 | 4 | |a ion microscopy | |
650 | 4 | |a ion microprobe analysis | |
650 | 4 | |a X-ray fluorescence analysis | |
650 | 4 | |a photoelectron spectroscopy | |
650 | 4 | |a Auger electron spectroscopy | |
650 | 4 | |a ion beam processing | |
650 | 4 | |a ion source | |
653 | |a ion implantation : semiconductor preparation | ||
700 | 1 | |a Datz, S., |e Hrsg. | |
900 | |a S 000344-0043,4'01' | ||
908 | |a Monographie, Sammelwerk | ||
949 | |a S 000344-0043,4'01' |w LC |c 1 |i 1085004496 |l STACKS |m ZB |r Y |s Y |t ZBB |u 25/3/2009 |x ZB-F |1 PRINT |