This title appears in the Scientific Report :
2012
Please use the identifier:
http://hdl.handle.net/2128/4524 in citations.
Please use the identifier: http://dx.doi.org/10.1002/cphc.201100738 in citations.
Chemical Etching of Zinc Oxide for Thin-Film Silicon Solar Cells
Chemical Etching of Zinc Oxide for Thin-Film Silicon Solar Cells
Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the struct...
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Personal Name(s): | Hüpkes, J. |
---|---|
Owen, J. I. / Pust, S. E. / Bunte, E. | |
Contributing Institute: |
Photovoltaik; IEK-5 |
Published in: | ChemPhysChem, 13 (2012) S. 66 - 73 |
Published in: |
ChemPhysChem 2012, 13, 66 – 73 |
Imprint: |
Weinheim
Wiley-VCH Verl.
2012
|
Physical Description: |
66 - 73 |
PubMed ID: |
22162035 |
DOI: |
10.1002/cphc.201100738 |
Document Type: |
Journal Article |
Research Program: |
Erneuerbare Energien |
Series Title: |
ChemPhysChem
13 |
Subject (ZB): | |
Link: |
Get full text OpenAccess |
Publikationsportal JuSER |
Please use the identifier: http://dx.doi.org/10.1002/cphc.201100738 in citations.
Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided. |