This title appears in the Scientific Report :
2009
Amorphous ternary rare-earth gate oxides for future integration in MOSFETs
Amorphous ternary rare-earth gate oxides for future integration in MOSFETs
Saved in:
Personal Name(s): | Roeckerath, M. |
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Lopes, J. M. J. / Durgun Özben, E. / Littmark, U. / Luptak, R. / Lenk, S. / Luysberg, M. / Besmehn, A. / Breuer, U. / Schubert, J. / Mantl, S. | |
Contributing Institute: |
Halbleiter-Nanoelektronik; IBN-1 JARA-FIT; JARA-FIT Zentralabteilung für Chemische Analysen; ZCH Mikrostrukturforschung; IFF-8 |
Published in: |
ULIS 2009 |
Imprint: |
2009
|
Conference: | Aachen 2009-03-18 |
Document Type: |
Talk (non-conference) |
Research Program: |
Grundlagen für zukünftige Informationstechnologien |
Publikationsportal JuSER |
Description not available. |