This title appears in the Scientific Report :
2007
Please use the identifier:
http://dx.doi.org/10.1088/0022-3727/40/6/S07 in citations.
Interface magnetization of ultrathin epitaxial Co2FeSi(110)/Al2O3 films
Interface magnetization of ultrathin epitaxial Co2FeSi(110)/Al2O3 films
Element-specific magnetic properties of ultrathin epitaxial Co2FeSi( 110) films were measured using x-ray magnetic circular dichroism ( XMCD). The epitaxial Heusler films were grown by RF magnetron sputtering on Al2O3( 1120) substrates. The magnetization of thicker films as determined by XMCD is sma...
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Personal Name(s): | Kallmayer, M. |
---|---|
Schneider, H. / Jakob, G. / Elmers, H. J. / Balke, B. / Cramm, S. | |
Contributing Institute: |
Institut für Festkörperforschung; IFF |
Published in: | Journal of physics / D, 40 (2007) S. 1552 - 1557 |
Imprint: |
Bristol
IOP Publ.
2007
|
Physical Description: |
1552 - 1557 |
DOI: |
10.1088/0022-3727/40/6/S07 |
Document Type: |
Journal Article |
Research Program: |
Kondensierte Materie |
Series Title: |
Journal of Physics D - Applied Physics
40 |
Subject (ZB): | |
Publikationsportal JuSER |
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520 | |a Element-specific magnetic properties of ultrathin epitaxial Co2FeSi( 110) films were measured using x-ray magnetic circular dichroism ( XMCD). The epitaxial Heusler films were grown by RF magnetron sputtering on Al2O3( 1120) substrates. The magnetization of thicker films as determined by XMCD is smaller than expected for a half-metallic material. In addition, the magnetization decreases considerably for films thinner than 10 nm. The thickness dependence of the magnetic moment can be described by introducing a certain number of dead layers representing a deficiency of magnetization at the interfaces. Quantitative evaluation results in a dead layer thickness of 0.8 nm at room temperature, consisting of a temperature induced size effect of 0.1 nm and a surface effect of 0.15 nm at the top and 0.55 nm at the bottom interface. | ||
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